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Top Quality Crystal - Silicon Carbide SiC – WMC

Sulfur or Sulphur is light yellow brittle crystal material. It dissolves in carbon disulfide and ethanol but insoluble in water, and can burn vigorously in oxygen.

High Purity Sulfur of 99.999% 5N and 99.9999% 6N in form of powder, lump, granule or flake by rectification process is primarily used in the manufacturing of II-VI compound semiconductors CdS, Arsenic Sulfide As2S3, Gallium Sulfide Ga2S3, Titanium Sulfide TiS2, Selenium Sulfide SeS2, Multi-element Sulfide Composite Electrode Material, photoelectric devices, glass semiconductor elements, Sodium sulfur batteries, CIS copper indium sulfur thin film solar cell and as analysis calibration specimens.

High Purity Sulfur at Western Minmetals (SC) Corporation with 99.999% 99.9999% 5N 6N purity is in size of powder, granule, lump, tablet and pill or customized specification can be delivered, which is packed in vacuumed composite aluminum bag, polyethylene bottle with cardboard drum or carton box outside

 


Details

Tags

No. Items Standard Specification
1 Size 2″ 3″ 4″ 6″
2 Diameter mm 50.8 0.38 76.2 0.38 100 0.5 150 0.5
3 Growth Method MOCVD MOCVD MOCVD MOCVD
4 Conductivity Type 4H-N, 6H-N, 4H-SI, 6H-SI
5 Resistivity Ω-cm 0.015-0.028; 0.02-0.1; >1E5
6 Orientation 0°±0.5°; 4.0° towards <1120>
7 Thickness μm 330±25 330±25 (350-500)±25 (350-500)±25
8 Primary Flat Location <1-100>±5° <1-100>±5° <1-100>±5° <1-100>±5°
9 Primary Flat Length mm 16±1.7 22.2±3.2 32.5±2 47.5±2.5
10 Secondary Flat Location Silicon face up: 90°, clockwise from prime flat ±5.0°
11 Secondary Flat Length mm 8±1.7 11.2±1.5 18±2 22±2.5
12 TTV μm max 15 15 15 15
13 Bow μm max 40 40 40 40
14 Warp μm max 60 60 60 60
15 Edge Exclusion mm max 1 2 3 3
16 Micropipe Density cm-2 <5, industrial; <15, lab; <50, dummy
17 Dislocation cm-2 <3000, industrial; <20000, lab; <500000, dummy
18 Surface Roughness nm max 1(Polished), 0.5 (CMP)
19 Cracks None, for industrial grade
20 Hexagonal Plates None, for industrial grade
21 Scratches ≤3mm, total length less than substrate diameter
22 Edge Chips None, for industrial grade
23 Packing Single wafer container sealed in Aluminum bag.

 

Linear Formula SiC
Molecular Weight 40.1
Crystal structure Wurtzite
Apperance Solid
Melting Point 3103±40K
Boiling Point N/A
Density at 300K 3.21 g/cm3
Energy Gap (3.00-3.23) eV
Intrinsic resistivity >1E5 Ω-cm
CAS Number 409-21-2
EC Number 206-991-8

 

  • Sample Available Upon Request
  • Safety Delivery of Goods By Courier/Air/Sea
  • COA/COC Quality Management
  • Secure & Convenient Packing
  • UN Standard Packing Available Upon Request
  • Quality Inspection Including XRD/SEM/ICP/GDMS etc
  • Full Scope of Trade Terms CPT/FOB/ CFR/CIP By Incoterms 2010
  • Flexible Payment Terms T/T D/P L/C Acceptable
  • Full Dimensional After-Sale Services
  • ISO9001:2015 Certified & Rohs/REACH Regulations Approval
  • Non-Disclosure Agreements
  • Non-Conflict Mineral Policy
  • Regular Environmental Management Review
  • Social Responsibility Fulfillment
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